Poly-break etching plant

State of the art technology for pure silicon.

The leading polysilicon chunk etching system for the highest quality silicon pieces

With the DECKER poly-break etching plant you achieve the maximum possible surface quality of your silicon. In this plant you will find state-of-the-art wet-chemical technologies and concentrated technical know-how. Another decisive advantage of this system is its low consumption of resources: Save a considerable amount of electricity, water and chemicals - and reduce your operating costs!

System characteristics: 

• Transportation of goods in special rotating drums
• Innovative drying concept 
• Uncontrolled reactions after the etching process are avoided by “fast product transfer” 
• Process and design are modularly adaptable 
• Processing of silicon for photovoltaics and microelectronics 
• Ergonomic loading and unloading 

Advantages: 

• Minimum operating costs 
• Superlative high-quality silicon 
• Innovative drying concept 
• Specially developed barrels 
• Reduced resource input 
• Sustainable system design individually adapted 
• Turnkey solution possible